Purity Detection Technologies for High-Purity Metals

ʻO kēia ka ʻikepili piha o nā ʻenehana hou loa, ka pololei, nā kumukūʻai, a me nā hiʻohiʻona noi.

I. Nā ʻenehana ʻike hou loa

?Kumukānāwai‌: Hoʻohana i ka tandem mass spectrometry (MS/MS) e hoʻopau i ka matrix interference, i hui pū ʻia me ka optimized pretreatment (eg, acid digestion a microwave dissolution), hiki ke ʻike i ka ʻike ʻana i nā mea ʻino a me ka metalloid ma ka pae ppb‌
?pololei: Ka palena ʻike haʻahaʻa e like me0.1 ppb‌, kūpono no nā metala ultra-pure (≥99.999% maʻemaʻe).
?Koina: ʻO ka lilo o nā mea hana kiʻekiʻe (~285,000–285,000–714,000 USD‌), me ka mālama pono a me nā koi hana

?Kumukānāwai‌ : Ka helu ʻana i nā haumia ma ka nānā ʻana i nā mea kikoʻī kikoʻī kikoʻī kikoʻī i hana ʻia e ka plasma excitation‌.
?pololei‌ : ʻIke i nā haumia pae ppm me kahi laina laina ākea (5-6 mau kauoha o ka nui), ʻoiai hiki ke hoʻopili ʻia ka matrix.
?Koina: Ke kumu kūʻai haʻahaʻa (~143,000–143,000–286,000 USD‌), kūpono no nā metala maʻemaʻe kiʻekiʻe (99.9%–99.99% maʻemaʻe) i ka hoʻāʻo ʻana.

?Kumukānāwai‌ : Hoʻokaʻawale pololei i nā ʻili hoʻohālike paʻa e pale aku i ka hoʻohaumia ʻana i ka hopena, e hiki ai i ka loiloi isotope abundance‌.
?pololei: Ke hiki aku nei na palena ikeppt-pae‌, i hoʻolālā ʻia no nā metala ultra-pure semiconductor-grade (≥99.9999% maʻemaʻe).
?Koina: Kiʻekiʻe loa (> $714,000 USD‌), kaupalena ʻia i nā laboratories holomua.

?Kumukānāwai‌ : Nānā i nā mokuʻāina kemika o ka ʻili no ka ʻike ʻana i nā ʻāpana oxide a i ʻole nā pae haumia‌78.
?pololei‌ : ʻO ka hoʻonā hohonu nanoscale akā ua kaupalena ʻia i ka nānā ʻana.
?Koina: Kiʻekiʻe (~$429,000 USD‌), me ka mālama paʻakikī.

II. Manaʻo ʻia ka ʻike ʻana

Ma muli o ke ʻano metala, ka pae maʻemaʻe, a me ka waihona kālā, ua ʻōlelo ʻia nā hui like ʻole:

?ʻenehana: ICP-MS/MS + GD-MS‌14
?Nā pono‌ : Uhi i nā mea haumia a me ka nānā ʻana i ka isotope me ka pololei loa.
?Nā noi: Nā mea semiconductor, sputtering targets.

?ʻenehana: ICP-OES + Kemimi Titration‌24
?Nā pono: He kumu kūʻai (huina pau ~$214,000 USD‌), kākoʻo i ka ʻike wikiwiki ʻana i nā mea he nui.
?Nā noi‌ : ʻOihana maʻemaʻe kiʻekiʻe, keleawe, etc.

?ʻenehana: XRF + ʻAi ʻAi 68
?Nā pono‌ : Hoʻopili ʻia ka nānā ʻana i ka non-destructive screening (XRF) me ka hōʻoia kemika kiʻekiʻe-pololei; huina kālā~71,000–71,000–143,000 USD?
?Nā noi: Nā mea nani, bullion, a i ʻole nā hiʻohiʻona e koi ana i ka pono o ka laʻana.

?ʻenehana‌ : Ka Hoʻokaʻina Kemika
?Nā pono: Ka huina kālā< $29,000 USD‌, kūpono no nā SME a i ʻole ka nānā mua ʻana‌.
?Nā noi‌ : Ka nānā ʻana i nā mea maka a i ʻole ka mana o ka maikaʻi ma ka pūnaewele.

III. Hoʻohālikelike ʻenehana a me ke alakaʻi koho

ʻenehana	Pono (Ka palena ʻike)	Uku (Lako + Mālama)	Nā noi
ICP-MS/MS	0.1 ppb	Kiʻekiʻe Loa ($428,000 USD)	Ka nānā ʻana i ka metala maʻemaʻe loa‌15
GD-MS	0.01 ppt	Kiʻekiʻe (>$714,000 USD)	ʻIke ʻana i ka isotope semiconductor-grade 48
ICP-OES	1 ppm	Kaumaha (143,000–143,000–286,000 USD)	ʻO ka hoʻāʻo ʻana no nā metala maʻamau‌56
XRF	100 ppm	Mawaena (71,000–71,000–143,000 USD)	ʻO ka nānā ʻana metala makamae ʻole hoʻopōʻino 68
ʻO ka hoʻoheheʻe ʻana i nā kemika	0.1%	Haʻahaʻa (<$14,000 USD)	Ka helu helu haʻahaʻa haʻahaʻa 24

Hōʻuluʻulu manaʻo

?Ka mea nui ma ka pololei‌ : ICP-MS/MS a i ʻole GD-MS no nā metala hoʻomaʻemaʻe ultra-kiʻekiʻe, e koi ana i nā kālā nui‌.
?Kaulike Kumu-kumu‌ : ICP-OES i hui pū ʻia me nā ʻano kemika no nā noi ʻoihana maʻamau‌.
?Nā Pono Hoʻopau ʻole: XRF + ahi no ka metala makamae.
?Hoʻopaʻa kālā‌ : Hoʻopili ʻia ka titration kemika me ka conductivity/thermal analysis no nā SME‌

Ka manawa hoʻouna: Mar-25-2025

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